Cross Section / Trench Analysis

Summary:
Automated, standard measurement analysis for CD-SEM and TEM cross section and trench images. Repeatable, accurate cross section analysis improves the usefulness of results, including OCD Scatterometry model setup. OCD scatterometry calibration accuracy can be improved, and model development time reduced, using SIMAGIS. Analysis of trench geometries with statistical distributions/histograms is included. Capabilities support qualitative (pass/fail) and quantitative analysis, inspection and identification of defects.

Image Types Supported:
Digital Images from CD-SEM, TEM, AFM and Optical Microscopes.

Sample preparation:
Sample preparation and imaging services are available through qualified Service Partners.

Sample Report:

Analysis Metrics/Outputs:

	Height
	Top width
	Bottom width
	Min width
	Max width
	Sidewall top position
	Trench bottom position
	Top to bottom width ratio
	SWA bottom angle left
	SWA bottom angle right
	SWA top angle left
	SWA top angle right

Customization of features, configuration settings, results and reports is available.